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  6. 奈米IC晶片-193nm曝光機製程:多重曝光
2025年中文版

奈米IC晶片-193nm曝光機製程:多重曝光

Author Kung Linliu
Publisher Kung Linliu /林劉恭
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Released
2025/02/03
Language
Traditional Chinese
File format
PDF (1MB), fit in large screen and Pubook
Pages
29
ID
489203
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IC晶片電路製作方法，主要是微影製程，2024年, IC製程已可量產3nm(奈米)!
2025年, IC製程已可試量產2nm(奈米)!
奈米壓印微影(NIL, Nano-imprint lithography process)製程是Canon最近幾年提出的，2023年Canon宣稱可以做到7nm(奈米)，2024年Canon又宣稱可以做到5 nm(奈米)!

Details

Released
2025/02/03
Language
Traditional Chinese
File format
PDF: Fit in large screen
Provide Adobe DRM
Provide PDF
Offer DRM free license
Yes
ID
489203

Buy products firstAnd download app to watch

Details
　　

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